Patent Name Photopolymerizable Compositions and Offset Printing Plates Derived from Them. Patent Owner Kraton Polymer Research Ltd. Principal Applicant Address Amsterdam Inventor X. Mujer Del Mans; O. Rumachet Application ( No. 200480000410.0 Date of application 2004.04.28 Application date 2004.04.28 Approval date Approval announcement No. 1698015 Approval announcement date 2005.11.16 Instruction CD No. D0546 Main classification number G03F7/033 Classification No. G03F7/033; B41M1/04 Partition Original application No. Priority item 2003.4 .29 EP 03076253.8 Abstract The present invention relates to a photopolymerizable composition comprising: (a) 20-99.9 wt% of one or more thermoplastics comprising the following formula based on the weight of components (a) and (b): Thermoplastic elastomeric block copolymers of elastomeric block copolymers: ACA(1) or (AC)subn/subX(2), wherein each A independently represents a predominantly monovinylic aromatic having an apparent molecular weight ranging from 7,000 to 25,000 A polymer block, wherein n is an integer equal to or greater than 2, and wherein X is a residue of a coupling agent, and wherein each C independently represents substantially random copolymerization of predominantly isoprene and butadiene Block (I/B), The mutual weight ratio ranges from 20/80 to 80/20, wherein the polymer block C has a glass transition temperature (Tg) of at most 0° C. (measured according to ASTM E-1356-98), and vinyl bond content ( The 1,2 and/or 3,4-addition of isoprene and butadiene ranges from 5 to 70 mol% and the poly(monovinylarene) content of the thermoplastic block copolymer ranges from 10 to 45 wt%. %, and the entire block copolymer has an apparent molecular weight in the range of 100000-1500000, (b) 1-60 wt% of one or more photopolymerizable olefinic bonds based on the weight of components (a) and (b) Unsaturated low molecular weight compounds, (c) based on the entire photopolymerizable composition, 1-10 wt% of one or more polymerization initiators; and optionally (d) 0-40 wt based on the entire photopolymerizable composition % of one or more auxiliaries; and relates to an offset printing plate derived from the photopolymerizable composition and a offset printing relief plate prepared from the plate. SATISFIED PROJECT 1. Photopolymerizable composition comprising: (a) 20-99.9 wt% of one or more thermoplastic elastomeric block copolymers comprising the following formula based on the weight of components (a) and (b): Thermoplastic elastomeric block copolymers of the invention: ACA(1) or (AC)nX(2) wherein each A independently represents a polymer block of predominantly monovinylarene with an apparent molecular weight ranging from 7,000 to 25,000, where n Is an integer equal to or greater than 2, and residues wherein X is a coupling agent, and wherein each C independently represents a substantially random copolymer block (I/B) which is predominantly isoprene and butadiene. , wherein the mutual weight ratio of isoprene and butadiene ranges from 20/80 to 80/20, wherein the glass transition temperature (Tg) of the polymer block C is at most 0°C (according to ASTM E-1356- (Measured by 98), and the vinyl bond content (1,2 and/or 3,4-polyaddition of isoprene and butadiene) ranges from 5 to 70 mol%, the poly(monoethylene) of the thermoplastic block copolymer The content of basic aromatic hydrocarbons is in the range of 10-45 wt%, and the apparent molecular weight of the entire block copolymer is in the range of 100000-1500000, (b) 1-60 wt% based on the weight of components (a) and (b). Or multiple photopolymerizable ethylenic bonds Unsaturated low molecular weight compounds, (c) 0.1-10 wt% of one or more polymerization initiators based on the entire photopolymerizable composition; and optionally (d) 0-40 wt based on the entire photopolymerizable composition % of one or more additives. International Application 2004-04-28 PCT/EP2004/050635 International Publication 2004-11-11 WO2004/097523 Date of Entry into the Country Patent Agency China Council for the Promotion of International Trade Patent and Trademark Office Office Location Agent Liu Minghai
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